Single Wafer Processor
Specifications & Configurations
- Process wafer size : 4” ~ 12”
- Process Chemical : Organic, Acid, Alkali Base
- Process chamber : 1~12 chambers
- Cassette stage : 1~4 stages
- Wafer handling robot : 3 or 4 axes robot
- Robot blade : Single or dual blade
- Wafer chuck : Mechanical or Vacuum type
- Wafer mapping system by robot
Auto Wet Station
Specifications & Configurations
- Wafer : up to 12”
- Chemical : Organic , Acid, Alkali Base
- Bath Materials : PTFE or Quartz
- Loader/Unloader : Stage carrying system
- Carrying Robot : Front loader section carrying system
- Dryer : S/D, IPA/D, MG/D/li>
- S/W : Wet Bench management system
Cassette Type
Specifications & Configurations
- Wafer : up to 12”
- Chemical : Organic , Acid, Alkali Base
- Bath Materials : PTFE or Quartz
- Loader/Unloader : Stage carrying system
- Carrying Robot : Front loader section carrying system
- Dryer : S/D, IPA/D, MG/D
- S/W : Wet Bench management system
Casseteless
Common specification
- Application wafer size : 8 to 12 inch wafer
- Transfer system : 1 or 2 Cassettes transfer robot
- Loading & Unloading : 2 or 4 cassettes stock
- Dryer application : Spin or IPA dryer
- Chemical supply : CCSS or LCSS
- FFU installation (Option)
- Auto shutter installation (Option)
- Drain Tank installation (Option)
- Wet Station Management System (Option)
EKC Stripper
Common specification
- Application wafer size : 8 to 12 inch wafer
- Transfer system : 1 or 2 Cassettes transfer robot
- Loading & Unloading : 2 or 4 cassettes stock
- Dryer application : Spin or IPA dryer
- Chemical supply : CCSS or LCSS
- FFU installation (Option)
- Auto shutter installation (Option)
- Drain Tank installation (Option)
- Wet Station Management System (Option)
Pre Cleaner
Common specification
- Application wafer size : 8 to 12 inch wafer
- Transfer system : 1 or 2 Cassettes transfer robot
- Loading & Unloading : 2 or 4 cassettes stock
- Dryer application : Spin or IPA dryer
- Chemical supply : CCSS or LCSS
- FFU installation (Option)
- Auto shutter installation (Option)
- Drain Tank installation (Option)
- Wet Station Management System (Option)
HF Dip Etcher
Common specification
- Application wafer size : 8 to 12 inch wafer
- Transfer system : 1 or 2 Cassettes transfer robot
- Loading & Unloading : 2 or 4 cassettes stock
- Dryer application : Spin or IPA dryer
- Chemical supply : CCSS or LCSS
- FFU installation (Option)
- Auto shutter installation (Option)
- Drain Tank installation (Option)
- Wet Station Management System (Option)
Mask Cleaner
Common specification
- Application wafer size : 8 to 12 inch wafer
- Transfer system : 1 or 2 Cassettes transfer robot
- Loading & Unloading : 2 or 4 cassettes stock
- Dryer application : Spin or IPA dryer
- Chemical supply : CCSS or LCSS
- FFU installation (Option)
- Auto shutter installation (Option)
- Drain Tank installation (Option)
- Wet Station Management System (Option)
